据美国智库“技术与国家治理中心”（Centre for Technology & Statecraft）于2026年9月底发布的报告，截至2026年初，中国半导体晶圆厂已采购了约343台浸没式深紫外（DUV）光刻系统。
US Think Tank Urges Full Export Ban After Chinese Fabs Stockpile Over 340 ASML DUV Lithography Machines Chinese semiconductor fabrication plants acquired an estimated 343 immersion deep ultraviolet (DUV) lithography systems by early 2026, according to a report published in late September 2026 by the Centre for Technology & Statecraft.
该研究由前美国出口管制官员尼古拉斯·布朗（Nicholas Brown）和前白宫顾问赛夫·汗（Saif Khan）共同撰写，指出这些系统可被重新利用以生产7纳米芯片及用于人工智能处理器的高级存储芯片。
The study, co-authored by former US export control official Nicholas Brown and former White House adviser Saif Khan, highlighted that these systems can be repurposed to produce 7-nanometer chips and advanced memory for artificial intelligence processors.
报告引用了主要向荷兰制造商ASML采购设备所涉及的数十亿美元支出数据，作者敦促华盛顿及其盟友政府对运往中国的浸没式DUV工具实施全面出口禁运。
Citing billions of dollars in equipment purchases primarily from Dutch manufacturer ASML, the authors urged Washington and allied governments to enact a comprehensive export embargo on immersion DUV tools shipped to China.